Coating apparatus – Gas or vapor deposition – Running length work
Patent
1982-07-12
1984-04-03
Smith, John D.
Coating apparatus
Gas or vapor deposition
Running length work
118719, 118723, 118730, 118722, 118 501, 427 47, 4272555, C23C 1310
Patent
active
044401078
ABSTRACT:
An apparatus for producing improved large area photovoltaic devices by substantially reducing the warpage of relatively large area, relatively thin webs of magnetic substrate material which travel through a plurality of high temperature, low pressure glow discharge deposition chambers. As the web of the substrate material moves through the deposition chambers, it assumes a normal, elongated path of travel. Due to the elevated deposition temperature, the elongated path of travel, the force of gravity, etc., the web has a tendency to warp. Warpage of the web is undesirable as it promotes the deposition of non-uniform semiconductor alloy layers. The improvement of the present invention contemplates the establishment of at least one magnetic field within each deposition chamber which is adapted to urge the web of substrate material out of its normal path of travel into a flat, substantially planar path of travel. The new flat path of travel serves to substantially reduce warpage of the web which permits uniform amorphous semiconductor alloy layers to be deposited. In alternate embodiments, the web of substrate material may be urged into sliding contact with a plurality of stationary ceramic magnets or the web may be urged into rolling contact with a plurality of rotatable magnetic elements which may either be hollow, ceramic magnets or electromagnets.
REFERENCES:
patent: 2731212 (1956-01-01), Baker
patent: 2925062 (1960-02-01), Schwindt
patent: 3661116 (1972-05-01), Moskowitz et al.
patent: 3898952 (1975-08-01), Shirahata et al.
patent: 3924563 (1975-12-01), Kessler et al.
patent: 4369730 (1983-01-01), Izu et al.
Cannella Vincent
Doehler Joachim
Gray, Jr. Richard O.
Energy Conversion Devices Inc.
Plantz Bernard F.
Siskind Marvin S.
Smith John D.
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