Methods for manufacturing photolithography masks utilizing inter

Details Methods for manufacturing photolithography masks utilizing inter Methods for manufacturing photolithography masks utilizing inter

1998-08-05

2000-08-01

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

060964588

ABSTRACT:
A method for manufacturing a photolithography mask. At least two interfering beams of radiation are utilized to define a grid of dividing lines corresponding to an interference pattern produced by the interfering beams on a surface of a photolithography mask coated with a mask film.

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