Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-06-04
1995-04-18
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 534557, G03F 7023, G03F 730
Patent
active
054077796
ABSTRACT:
A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid ester of at least one phenol compound represented by the following general formulas: ##STR1## wherein R.sub.1 represents hydrogen, halogen, or the like; R.sub.3 represents alkyl or phenyl; x represents 1-3; Q.sub.1 to Q.sub.12 represent hydrogen, alkyl or phenyl; and Z.sub.1 to Z.sub.5 represent the groups of the following formulas: ##STR2## wherein R.sub.2 is hydrogen, halogen or the like; R.sub.3 is as defined above; y is 1-3; and p is 0 or 1. This positive resist composition is excellent in the balance between properties such as resolution, profile, depth of focus, etc.
REFERENCES:
patent: 5153096 (1992-10-01), Uenishi et al.
patent: 5173389 (1992-12-01), Uenishi et al.
SPIE vol. 1086 Advances in Resist Technology and Processing VI (1989) pp. 363-373.
Nakanishi Hirotoshi
Tomioka Jun
Uetani Yasunori
Bowers Jr. Charles L.
Chu John S.
Sumitomo Chemical Company Limited
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