Method for preparing positive resist image

Details Method for preparing positive resist image Method for preparing positive resist image

1975-06-30

1976-10-05

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427273, 96 351, B05D 306

Patent

active

039845826

ABSTRACT:
A positive resist image is produced by exposing, to radiation in a predetermined pattern, a polymeric material containing polymerized alkyl methacrylate units and polymerized monoethylenically unsaturated acid units. The exposed and unexposed areas are distinguished by their different respective abilities to be swelled in an appropriate swelling agent, and the swelled areas are removed by dispersal in a nonsolvent liquid.

REFERENCES:
patent: 3104175 (1963-09-01), Marx et al.
patent: 3799777 (1974-03-01), O'Keefe et al.
Kovaleva "Chem. Abstracts" 80, 9023u.

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