Desensitizing solution for lithography

Details Desensitizing solution for lithography Desensitizing solution for lithography

1997-03-27

1999-10-12

Reddick, Judy M.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

At least one aryl ring which is part of a fused or bridged...

1014501, 106 2, 524376, 524386, 524544, 526248, 526276, 526278, C08L 4100

Patent

active

059656603

ABSTRACT:
A desensitizing solution for lithography is disclosed which contains at least one member selected from acyclic amine and ammonium compounds each containing specific structures. The desensitizing solution does not cause environmental pollution, is stable to long-term storage, continuous use, and fluctuations in environmental conditions, is effective in reducing the time required for etching treatment, and has excellent desensitization performance.

REFERENCES:
patent: 3615444 (1971-10-01), Ohkubo et al.
patent: 3803070 (1974-04-01), Spencer et al.
patent: 4454216 (1984-06-01), Horii et al.
patent: 4501811 (1985-02-01), Saikawa et al.
patent: 4510228 (1985-04-01), Tsubai et al.
patent: 5047311 (1991-09-01), Endo et al.
patent: 5174815 (1992-12-01), Kondo et al.

Affiliated with

Also associated with

Rating

Desensitizing solution for lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Desensitizing solution for lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Desensitizing solution for lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-653452