Method for producing mask ROM and photomask used therefor

Details Method for producing mask ROM and photomask used therefor Method for producing mask ROM and photomask used therefor

1998-02-09

1999-10-12

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059653027

ABSTRACT:
According to the present invention, a photomask for providing a pattern to a resist applied on a substrate is provided. The photomask includes a light blocking region forming a boundary between a first region and a second region on the substrate. A width of the light blocking region is such that the light blocking region is not projected on the resist.

REFERENCES:
patent: 5370975 (1994-12-01), Nakatani
patent: 5650250 (1997-07-01), Moon

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