X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1988-03-25
1990-01-23
Howell, Janice A.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 86, G01N 23201
Patent
active
048963429
ABSTRACT:
The invention relates to an X-ray apparatus, comprising an essentially monochromatic radiation source which irradiates an examination zone in different positions by means of a primary beam having a small cross-section, a first position-sensitive detector device which measures, on the other side of the examination zone, the radiation elastically scattered in the primary beam, and means for reconstructing an image of the irradiated cross-section. Assignment of an X-ray quantum is realized in that the first detector device is constructed so that it measures essentially the energy loss of the X-ray quanta incurred therein due to Compton scattering, there also being provided a second position-sensitive detector device, and a coincidence device which determines the coincidence of the signals of the two detector devices, the reconstruction means being constructed so that, in the case of coincidence of the detector output signals, the path of the X-ray quantum causing these signals is determined and therefrom, and from the energy loss measured in the first detector device, the position of the scatter point on the primary beam is determined.
REFERENCES:
patent: 3936638 (1976-02-01), Gibbons
patent: 3961186 (1976-06-01), Leunbach
patent: 3965353 (1976-06-01), Macovski
patent: 4653083 (1987-03-01), Rossi
patent: 4716581 (1987-12-01), Barnd
Freeman John C.
Haken Jack E.
Howell Janice A.
U.S. Philips Corporation
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