Process for electrodeposition of resist formulations which conta

Details Process for electrodeposition of resist formulations which conta Process for electrodeposition of resist formulations which conta

1994-03-04

1995-05-16

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

2041806, 430287, 430270, C25D 1310

Patent

active

054157498

ABSTRACT:
A process for electrodepositing a coating on an electroconductive article employed as an anode by immersing the electroconductive article in a photoimageable electrodeposition coating composition comprising an aqueous dispersion of (a) a water-soluble or water-dispersible polymer having an acid value of 20 to 300, and a number average molecular weight of not less than 300 with the proviso that when the polymer is unsaturated, it has an unsaturated equivalent of 150 to 3000, and when the polymer is saturated it is used in combination with an ethylenically unsaturated compound; (b) an initiator or initiating system, and (c) a defined metal salt of a .beta. diketone.

REFERENCES:
patent: 4455364 (1984-06-01), Sasa
patent: 4845012 (1989-06-01), Seko et al.
patent: 4943513 (1990-07-01), Lipson et al.
patent: 5344740 (1994-09-01), Iwasawa et al.

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