Single-wafer heat-treatment apparatus and method of manufacturin

Details Single-wafer heat-treatment apparatus and method of manufacturin Single-wafer heat-treatment apparatus and method of manufacturin

1996-01-11

1997-07-29

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

C23C 1600

Patent

active

056518277

ABSTRACT:
A reactor vessel includes a quartz glass body having sidewalls and a ceiling formed as a single unit without welds. Translucent or opaque portions are formed by bubbles in the glass where heat insulation is desired and transparent portions are formed by absence of bubbles where heat transmission and visibility are desired. The body is formed by adding quartz glass powder to a mold which is rotated about a central axis so that centrifugal force causes a layer of powder to form on the inside of the mold. The layer is then heated until it melts.

REFERENCES:
patent: 4911896 (1990-03-01), Bihuniak
patent: 4926793 (1990-05-01), Arima
patent: 5244500 (1993-09-01), Ebata
patent: 5306388 (1994-04-01), Nakajima
Super LSI Fabrication Testing Apparatus Guide Book, Kogyo Chosakai, pp. 56-58.

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