Process for forming multilayer thin film

Details Process for forming multilayer thin film Process for forming multilayer thin film

1988-02-12

1990-06-12

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437100, 437173, 437170, 437 81, H01L 21265

Patent

active

049333003

ABSTRACT:
A superlattice film is formed by introducing a mixture of a first gas reactant capable of only plasma-excited chemical reaction and a second gas reactant capable of both plasma-excited chemical reactions into a reaction chamber, discontinuously carrying out plasma-excited chemical reaction, and continuously carrying out light-excited chemical reaction, thereby alternately depositing on a substrate a thin film layer which is formed when the plasma- and light-excited chemical reactions are carried out and another thin film layer which is formed when the plasma-excited chemical reaction is interrupted, thereby forming a thin film of alternately deposited layers.

REFERENCES:
patent: 4659401 (1987-04-01), Reif
patent: 4705912 (1987-11-01), Nakashima
patent: 4719123 (1988-01-01), Hakn et al.
patent: 4726963 (1988-02-01), Ishihara
Kawasaki et al, Nature (1988), 331 (6152); 153-155.
News and Views, Nature vol. 331, Jan. 14, 1988, p. 16, Making Multilayered Samples.

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