Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1984-03-12
1985-09-03
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430966, 430967, 378 35, 2505051, G03F 900
Patent
active
045392781
ABSTRACT:
A mask substrate for use in X-ray lithography formed of a composite, X-ray transparent member which is stretched over a fixture to a predetermined tension and then adhered to a borosilicate glass ring. In accordance with a preferred embodiment, the composite member includes a film of polyborane which has been grown in compression, onto which a polyimide is coated. The polyborane film is grown on a silicon wafer, coated with the polyimide, after which the central area of the wafer is etched away. The borosilicate glass is adhered to the polyimide side of the composite, leaving the tensioned polyborane surface open for the application of an X-ray absorptive pattern thereto to define a complete mask structure suitable for use in X-ray lithography.
REFERENCES:
patent: 4037111 (1977-07-01), Coquin et al.
patent: 4171489 (1979-10-01), Adams et al.
patent: 4253029 (1981-02-01), Lepselter et al.
patent: 4254174 (1981-03-01), Flanders et al.
patent: 4260670 (1981-04-01), Burns
patent: 4454209 (1984-06-01), Blais
Buckley et al., "X-Ray Lithography Mask Technology," Ninth International Conf. Electron Ion Beam Science and Technology, May 11-16, 1980, Report No. 14806.
Brors Daniel L.
Williams Bob J.
Dees Jos,e G.
Eaton Corporation
Grace C. H.
Kittle John E.
Sajovec F. M.
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