Photo-mask for production of substrate for optical memory elemen

Details Photo-mask for production of substrate for optical memory elemen Photo-mask for production of substrate for optical memory elemen

1986-11-12

1988-08-16

Powell, William A.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

1566591, 430313, G03F 900

Patent

active

047644419

ABSTRACT:
A photo-mask which is used for the production of a substrate for an optical memory element includes a reflective film formed over an ultraviolet non-transmissive film on a substrate. Alternatively, a multi-layer dielectric film which is not transmissive to light of wavelength about 400 nm but transmissive to light of wavelength about 450 nm is formed on a substrate.

REFERENCES:
patent: 4440841 (1984-04-01), Tabuchi
patent: 4544443 (1985-10-01), Ohta et al.
patent: 4670365 (1987-06-01), Yoshihara

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