Stock material or miscellaneous articles – Composite – Of silicon containing
Patent
1986-07-01
1988-08-16
Lesmes, George F.
Stock material or miscellaneous articles
Composite
Of silicon containing
427 35, 427431, 427162, 427164, 428195, 428210, 428212, 428689, 428702, 430 5, 430275, 430296, 430308, B05D 306, B32B 904, G03F 900
Patent
active
047644320
ABSTRACT:
A photomask useful as stencil or reticle comprises a thin layer, which includes regions of different optical transmissivity for light radiation of a predetermined spectral range. The layer consists of silicon or any other suitable semiconductor material, and the regions of different transmissivity consist essentially of the monocrystalline or amorphous phase of the mask material. The photomask may be manufactured by irradiating a thin layer of monocrystalline silicon with a focussed ion beam to convert the silicon within the irradiated regions into the amorphous phase.
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Lesmes George F.
Max Planck-Gesellschaft zur Forderung der Wissenschaften E.V.
Monroe James B.
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