Photosensitive naphthoquinone diazide sulfonyl ester compounds f

Details Photosensitive naphthoquinone diazide sulfonyl ester compounds f Photosensitive naphthoquinone diazide sulfonyl ester compounds f

1987-04-17

1988-07-19

Bowers,, Jr.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430270, 430292, 430302, 430920, 534557, G03C 154, C07C11300

Patent

active

047584971

ABSTRACT:
The invention features a new series of triazine compounds which are characterized by their ability to generate free radicals upon irradiation in a desired optical region, such that they are useful in the fabrication of lithographic plates having improved exposure speed, development, print-out, and contrast characteristics.

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