Method of ionizing gas within cathode-containing chamber

Radiant energy – Ion generation – Electron bombardment type

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250423R, 3133591, 31511181, H01J 2700

Patent

active

048839698

ABSTRACT:
Method of ionizing a gas within a chamber having a cathode disposed therein, wherein the sputtering effect upon the cathode is substantially reduced to prolong the life of the cathode. The cathode within the chamber is initially activated to emit thermal electrons by applying a voltage thereto. The gas to be ionized is then introduced into the chamber along with an active gas. Ionization of the gas to be ionized is then achieved by subjecting the gas to be ionized to the thermal electrodes emitted by the cathode. The voltage applied to the cathode and the voltage between the cathode and the wall of the chamber are regulated so as to maintain a substantially constant electric arc current flowing from the wall of the chamber to the cathode. A predetermined mixture ratio is maintained as between the active gas and the gas to be ionized within the chamber so as to induce growth in the volume of the cathode at least partially offsetting the removal of atoms from the cathode caused by sputtering, the predetermined mixture ratio being maintained by controlling the introduction of the active gas into the chamber.

REFERENCES:
patent: 3406283 (1968-10-01), Williams
patent: 3916034 (1975-10-01), Tsuchimoto
patent: 3924134 (1975-12-01), Uman
patent: 4123686 (1978-10-01), Keller et al.
patent: 4658143 (1987-04-01), Tokiguchi et al.

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