MOS fuse with oxide breakdown and application thereof to memory

Static information storage and retrieval – Read only systems – Fusible

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365104, 365185, 257529, 257922, G11C 1700, H01L 2702, H01L 27115

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active

052914348

ABSTRACT:
A MOS fuse with oxide breakdown based on a MOS cell electrically programmable by tunnel effect and storage of charges at a gate. This cell is converted into a fuse by providing for the application, when the fuse has to break down, of an intense field, greater than the oxide breakdown threshold, in the tunnel window. Thus, the breakdown is irreversible. The disclosed device can be applied notably to fuses designed for the integrated circuits of memory cards.

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patent: 5146307 (1992-09-01), Kaya
Sato et al., "A New Programmable Cell Utilizing Insulator Breakdown", International Electron Devices Meeting, Wash., D.C., U.S., Dec. 1985, pp. 639-642.
Bhattacharyya et al., "Hard Coupled Sandwiched High Density Floating Gate Cell", IBM Technical Disclosure Bulletin, vol. 23, No. 2, Jul., 1980, pp. 543-545.

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