Electron beam exposure apparatus and its control method

Details Electron beam exposure apparatus and its control method Electron beam exposure apparatus and its control method

1998-05-21

2000-08-22

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250358, 2504511, H01J 3704

Patent

active

061076368

ABSTRACT:
An electron beam exposure apparatus for drawing a pattern on an object to be exposed using a plurality of electron beams includes an electron source for emitting electrons, a plurality of elementary electron optical systems for respectively forming intermediate images of the electron source, a projection electron optical system for projecting the plurality of intermediate images onto the object, a scanning unit for scanning the plurality of intermediate images to be projected onto the object within a plurality of elementary exposure fields in accordance with a common scanning width so as to expose a unit exposure field made up of the plurality of elementary exposure fields, and an adjustment unit for dynamically adjusting a minimum scanning width of the common scanning width in correspondence with a feature of a pattern to be drawn by exposure in the corresponding unit exposure field of the object.

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patent: 5834783 (1998-11-01), Muraki

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