Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters
Patent
1992-05-08
1994-03-01
Wieder, Kenneth A.
Electricity: measuring and testing
Impedance, admittance or other quantities representative of...
Lumped type parameters
324158R, 324538, 324703, 324713, G01R 2714
Patent
active
052911420
ABSTRACT:
A testing method and apparatus for conductive materials using electric current which makes it possible to rapidly evaluate the electromigration resistance of conductive materials. The apparatus includes a substrate support for supporting a substrate on which an interconnector pattern is formed, a cooling vessel for cooling the substrate, a first current supply for applying a first current to the interconnector, a resistance measurer for measuring the resistance of the interconnector pattern while the first electric current is being applied to the interconnector pattern, a second current supply for applying a second electric current larger than the first electric current to the interconnector pattern, and a controller which controls the repetition of the measurement of resistance of the interconnector pattern and the application of the second current to the interconnector pattern.
REFERENCES:
patent: 3710251 (1973-01-01), Hagge et al.
patent: 4483629 (1984-11-01), Schwarz et al.
patent: 4567432 (1986-01-01), Buol et al.
patent: 4739258 (1988-04-01), Schwarz
"Wafer-Level J-Ramp and J-Constant Electromigration Testing . . . ", by Katto, et al., International Reliability Physics Symposium, pp. 298-305, 1991 (no month).
Tobin Christopher
Wieder Kenneth A.
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