Exposure method and exposure apparatus using it

Details Exposure method and exposure apparatus using it Exposure method and exposure apparatus using it

1997-12-12

2000-08-22

Gibson, Sharon

Radiation imagery chemistry: process, composition, or product th

Including exposure step or specified pre-exposure step...

430394, 430396, 355132, H01L 21027, G03F 720

Patent

active

061070130

ABSTRACT:
An exposure method includes the phase-shifting mask supply step, the phase-shifting mask being prepared by selectively forming a light-shielding portion and a phase shifter on a substrate, and the resist exposure step of performing both exposure of a resist by dark field illumination light and exposure of the resist by bright field illumination light by using the phase-shifting mask, thereby removing residual resist generated by the influence of the edge of the phase shifter.

REFERENCES:
patent: 5440426 (1995-08-01), Sandstrom
patent: 5473409 (1995-12-01), Takeda et al.
patent: 5538833 (1996-07-01), Ferguson et al.

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