Hydrogen radical producing apparatus

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...

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422906, B01J 1908

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active

055749585

ABSTRACT:
An apparatus for producing hydrogen radicals, includes (a) a pipe having a cross-sectional area decreasing toward one end from the other thereof, the pipe being composed of metal having a high melting point, (b) a filament for generating heat by running an electrical current therethrough, the filament being disposed in the pipe free of contact with the pipe, and (c) a hydrogen gas source for supplying hydrogen gas to the pipe through the end of the pipe with the larger cross-sectional area. The pipe is electrically isolated from any peripherals, including the filament. The apparatus provides a high production rate of hydrogen radicals, and also prevents gas leakage therefrom, avoiding contamination.

REFERENCES:
patent: 3916034 (1975-10-01), Tsuchimoto
patent: 4740263 (1988-04-01), Imai et al.
patent: 4859490 (1989-08-01), Ikegaya et al.
patent: 4900628 (1990-02-01), Ikegaya et al.
patent: 5145712 (1992-09-01), Jesser et al.
patent: 5269848 (1993-12-01), Nakagawa
patent: 5399230 (1995-03-01), Takatani et al.
"Condensed Chemical Dictionary", G. G. Hawley, 1981, pp. 42-43.
Takeyoshi Sugaya et al., "Low-Temperature Cleaning of GaAs Substrate by Atomic Hydrogen Irradiation", Japanese Journal of Applied Physics, vol. 30, No. #A, Mar. 1991, pp. L402-L404.

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