Plasma etching device and process

Details Plasma etching device and process Plasma etching device and process

1980-06-26

1981-12-08

Rubinson, Gene Z.

Electric heating

Metal heating

By arc

219121PD, 219121PE, 204192E, 204298, 156646, 250539, B23K 700

Patent

active

043049834

ABSTRACT:
A plasma etching device having a quartz cylinder surrounded by RF energized electrodes or coils, contains a slotted aluminum tube into which wafers for etching are supported and processed. Each of the slots of the aluminum tube is provided with a shield extending longitudinally of the slot to intercept optical radiation, including deleterious ultraviolet (UV) radiation, of the plasma from entering the tube while still permitting the active etchant particles to pass into the tube to act on the wafers.

REFERENCES:
patent: 1926473 (1933-09-01), Wood
patent: 3879597 (1975-04-01), Bersin et al.
patent: 4115184 (1978-09-01), Poulsen
patent: 4147564 (1979-04-01), Magee et al.
patent: 4151064 (1979-04-01), Kuehnle
patent: 4160690 (1979-07-01), Shibagaki et al.

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