Photosensitive composition with o-quinonediazide compound and co

Details Photosensitive composition with o-quinonediazide compound and co Photosensitive composition with o-quinonediazide compound and co

1983-11-10

1985-08-20

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430193, 430302, 430326, G03C 160, G03C 154, G03F 708

Patent

active

045364648

ABSTRACT:
The photosensitive composition suitable as a posi-posi photosensitive composition for photosensitive lithographic printing plates is composed of a high molecular compound shown by following general formula I or II and an o-naphthoquinonediazide compound; ##STR1## wherein R.sub.1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms and R.sub.2 and R.sub.3 each is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
When the photosensitive composition is used as a photosensitive layer of a photosensitive lithographic printing plate and the plate is developed by rubbing with a sponge containing a developer, the photosensitive composition at the exposed areas is completely removed leaving no patches of the composition.

REFERENCES:
patent: 3647443 (1972-03-01), Rauner et al.
patent: 4115128 (1978-09-01), Kita
patent: 4123279 (1978-10-01), Kobayashi
patent: 4347305 (1982-08-01), Shiba et al.

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