Polymer having silicon atoms and sulfonium salt units and photor

Details Polymer having silicon atoms and sulfonium salt units and photor Polymer having silicon atoms and sulfonium salt units and photor

1997-02-12

1998-05-05

Lee, Helen

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

528 25, 528 29, C08G 7706

Patent

active

057476225

ABSTRACT:
A polymer having silicon atoms and sulfonium salt units in its main chain is provided which is obtained from a reaction between a polymer having silicon atoms, which is obtained by polymerizing 4,4'-thiodiphenol or a mixture of 4,4'-thiodiphenol and a diol compound and a silane or siloxane derivative, and a diaryliodonium salt or an alkyl. halide. The polymer having both silicon atoms and sulfonium salt units in its main chain are useful as a photoacid generator for chemically amplified resist and a base resin and a dissolution inhibitor for the resist.

REFERENCES:
patent: 4264703 (1981-04-01), Crivello
patent: 4374066 (1983-02-01), Crivello et al.
patent: 5466845 (1995-11-01), Herzig
Tanaka et al. J. Photopolymer Sci. and Techn. vol. 6(1), 1993, 39-48.
Crivello et al., "A New Preparation of Triarylsulfonium and -selenonium Salts via the Copper (II) . . . and Selenides with Diaryliodonium Salts", J. Org. Chem., vol. 43, No. 15, 1978, pp. 3055-3058.
C. W. Wilkins, Jr., et al., "An organosilicon novalac resin for multilevel resist applications", J. Vac. Sci. Technol. B, vol. 3, No. 1, Jan./Feb. 1985, pp. 306-309.
He et al., "Wavelength Dependence of the Photolysis of Some Anthracene-Containing Sulfonium Salts", J. Org. Chem., vol. 57, 1992, pp. 759-761.
G. L. Gaines, Jr., "Solvatochromic Compound as an Acid Indicator in Nonaqueous Media", Analytical Chemistry, vol. 48, No. 2, Feb. 1976, pp. 450-451.

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