Method of coating with a stoichiometric compound

Details Method of coating with a stoichiometric compound Method of coating with a stoichiometric compound

1979-10-01

1981-07-28

Kaplan, Morris

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 85, 427 87, B05D 306, C23C 1308, H01L 736

Patent

active

042810299

ABSTRACT:
A method of coating which comprises the steps of separately vaporizing a plurality of substances containing the component elements of a desired compound and placed in a plurality of crucibles to form vapors of the substances, mixing the vapors in a heated mixing chamber to form a mixed vapor, jetting the mixed vapor into a vacuum region to form clusters, ionizing the clusters to form cluster ions, and accelerating the cluster ions to make them impinge on a substrate.
An apparatus for coating which comprises a plurality of crucibles for separately vaporizing substances containing the component elements of a desired compound to form vapors of the substances, a mixing chamber for heating and mixing the vapors introduced therein to form a mixed vapor, the mixing chamber having at least one injection hole for jetting the mixed vapor into a vacuum region, communication pipes for connecting the mixing chamber to the crucibles, an ionization chamber for ionizing clusters produced from the mixed vapor jetted from the mixing chamber, means for accelerating cluster ions produced in the ionization chamber and making them impinge on a substrate, and a substrate holder for holding the substrate.

REFERENCES:
patent: 3127226 (1964-03-01), Rector
patent: 3839084 (1974-10-01), Cho et al.
patent: 3974059 (1976-08-01), Murayama
patent: 4082636 (1978-04-01), Takagi
Jo. of Crystal Growth, 31 (1975), pp. 333-338, "Synthesis and Epitaxial Growth of Catefilms by Neutral and Ionized Beams", Veda.
Jo. Vac. Sci. Tech., vol. 13, No. 4, Jul./Aug. 1976, pp. 920-925, "Surface Charge Transport lnPbs.sub.x Se.sub.l-x and Pb.sub.l-y SnySe", Jensen et al.
The Review of Sci. Instruments, vol. 41, No. 11, Nov. 1970, pp. 1654-1657, Beecham, "Cadmium/Sulfur Isothermal Source for CdS Deposition".

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