Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

1998-04-24

2000-07-11

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

355 52, 355 53, 355 55, G03B 2742, G03B 2752, G03B 2768

Patent

active

060880805

ABSTRACT:
An exposure apparatus includes a stage for holding a substrate at an exposure station, an arm mechanism for conveying a substrate to be exposed, onto the stage, and a sensor provided on one of the stage and the arm mechanism, for measuring temperature of the substrate to be exposed. On the basis of the measured temperature, pattern projection magnification to the workpiece, for example, is corrected.

REFERENCES:
patent: 4564284 (1986-01-01), Tsutsui
patent: 4699505 (1987-10-01), Komoriya et al.
patent: 5063582 (1991-11-01), Mori et al.
patent: 5231291 (1993-07-01), Amemiya et al.
patent: 5329126 (1994-07-01), Amemiya et al.
patent: 5825470 (1998-10-01), Miyai et al.

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