Semiconductor laser and method for manufacturing the same

Coherent light generators – Particular active media – Semiconductor

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257101, 257102, H01S 319

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active

056174381

ABSTRACT:
A semiconductor laser having an oscillation wavelength of not more than 450 nm comprises a substrate, a lower cladding layer containing a III-V Group compound semiconductor as a main component formed on the substrate, an active layer containing the III-V Group compound semiconductor as a main component formed on the lower cladding layer and an upper p-type cladding layer containing III-V Group compound semiconductor as a main component. Mg and Si are contained in the upper p-type cladding layer. A GaN series compound semiconductor is preferably used as the III-V Group compound semiconductor and the upper cladding layer contains preferably not less than 5.times.10.sup.18 /cm.sup.3 of Si.

REFERENCES:
Shen et al., "Rapid Isothermal Processing of Si+ /P+ and Mg+ /P+ Co-Implantations into InP", IEEE Transactions On Electron Devices, vol. 39, No. 1, pp. 209-211.
Shuji Nakamura, et al. "Thermal Annealing Effects On P-Type Mg-Doped GaN Films", Japanese Journal of Applied Physics, vol. 31, 1992, pp. L139-L142. (no month available).
Shuji Nakamura, et al. "Hole Compensation Mechanism Of P-Type GaN Films", Japanese Journal of Applied Physics, vol. 31, 1992, pp. 1258-1266. (no month available).
Shuji Nakamura, et al. "Candela-Class High-Brightness InGaN/AlGaN Double-Heterostructure Blue-Light-Emitting Diodes", Applied Physics Letters, vol. 64, No. 13, Mar. 28, 1994, pp. 1687-1689.

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