Method for fabricating a very dense chip package

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

438110, H01L 2144, H01L 2148, H01L 2150

Patent

active

060871997

ABSTRACT:
A method for fabricating an integrated circuit package or arrangement includes providing a carrier having a surface topography of projections or recesses for supporting individual semiconductor circuit chips having conversely matching bottom surface topographies to permit self-aligned positioning of the chip on the carrier. Chips are provided such that top faces of neighboring chips lie substantially in planes separated by a distance of greater than 0.0 .mu.m. The carrier is arranged and dimensioned such that the neighboring chips are separated by a gap G or spacing in a range of 1 .mu.m<G.ltoreq.100 .mu.m. A metallic interconnect is provided over the top faces and the gap. Preferably, the interconnect has a gradual slope over the gap.

REFERENCES:
patent: 4489364 (1984-12-01), Chance et al.
patent: 4542397 (1985-09-01), Biegelsen et al.
patent: 4670770 (1987-06-01), Tai
patent: 4709468 (1987-12-01), Wilson
patent: 4783695 (1988-11-01), Eichelberger et al.
patent: 4884122 (1989-11-01), Eichelberger et al.
patent: 4933042 (1990-06-01), Eichelberger et al.
patent: 4949148 (1990-08-01), Bartelink
patent: 4954875 (1990-09-01), Clements
patent: 4967146 (1990-10-01), Morgan et al.
patent: 5019535 (1991-05-01), Wojnarowski et al.
patent: 5023205 (1991-06-01), Reche
patent: 5034091 (1991-07-01), Trask et al.
patent: 5091330 (1992-02-01), Cambou et al.
patent: 5168344 (1992-12-01), Ehlert et al.
patent: 5207866 (1993-05-01), Lue et al.
patent: 5229647 (1993-07-01), Gnadinger
patent: 5331203 (1994-07-01), Wojnarowski et al.
patent: 5353493 (1994-10-01), Fillion et al.
patent: 5353498 (1994-10-01), Fillion et al.
patent: 5355102 (1994-10-01), Kornrumpf et al.
patent: 5373627 (1994-12-01), Grebe
patent: 5432681 (1995-07-01), Linderman
patent: 5561085 (1996-10-01), Gorowitz et al.
patent: 5770884 (1998-06-01), Pogge et al.
patent: 5783340 (1998-07-01), Farino et al.
patent: 5814885 (1998-09-01), Pogge et al.
patent: 5866443 (1999-02-01), Pogge et al.
patent: 5904495 (1999-05-01), Burke et al.
M. Gdula, et al, "A 36-Chip Multiprocessor Multichip Module With The General Electric High Density Interconnect Technology" IEEE, V.91, pp. 727-730, 1991.
H. Linde, et al, "Wet Silicon Etching With Aqueous Amine Gallates" Jrl. Electrochemical Soc., V.139, #4. pp. 1170-1174, Apr. 1992.
Marketing Materials, "High Denisty Multichip Interconnect-Reliability Data" Hughes Microelectronic Circuits Division, A Subsidiary of GM Hughes Electronics, Newport Beach, CA 3 pages, post 1992.
R.J. Wojnarowski, et al. "Three Dimensional Hybrid Wafer Scale Integration Using the GE High Density Interconnect Technology" IEEE Confedrence on Wafer Scale Integration, Ses. 7, WSI Tech. 1-p308-316 1993.
M. Despont, et al. "New Design of Micromachined Capacitive Force Sensor" Jrl. of Micromechanics & Microengineering V 3, #4, pp. 239-242, Dec. 1993.
D. Sandler, et al., "Fabrication of Metallic Microstructures by Electroplating Using Deep-Etched Silicon Molds Molds" IEE, Jrl. of Microelectromechanical Systems, V.4 #2, pp. 81-86, Jun. 1995.
J.P. Krusius, et al., "Tiled Silicon Report", pp. 1-18, shows 040996.
J. Talghader, et al., "Integration of Fluidically Self-Assembled Optoelectronic Devices Using a Silicon-Based Process" IEEE Photonics Technology Letters, 7, No. 11, Nov. 1995.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for fabricating a very dense chip package does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fabricating a very dense chip package, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating a very dense chip package will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-541564

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.