Method of manufacturing solid state image sensing device

Details Method of manufacturing solid state image sensing device Method of manufacturing solid state image sensing device

1995-05-31

1996-11-19

Picardat, Kevin

Fishing, trapping, and vermin destroying

437 3, 437 4, 437183, 437199, H01L 2170

Patent

active

055762395

ABSTRACT:
An aluminum film for covering an interlayer insulating film is formed by sputtering, and is then subjected to a heat treatment at a temperature lower than its melting point to cause a reflow. Then, an opening is formed in the aluminum film, so that a light shielding film is formed in such a way as to cover the step portion with a uniform thickness. Making the light shielding film of a solid state image sensing device thinner permits the opening size of the light shielding film to increase, ensures the effective use of light to improve the sensitivity, and improves the working precision in forming the opening, thus suppressing a variation in the sensitivity of the individual pixels.

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patent: 5254480 (1993-10-01), Tran
patent: 5366905 (1994-11-01), Mukai
patent: 5416344 (1995-05-01), Ishizuya et al.
patent: 5436458 (1995-07-01), Tran et al.
patent: 5443995 (1995-08-01), Nulman
patent: 5492852 (1996-02-01), Minami

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