Positive type photoresist composition comprising a novolak resin

Details Positive type photoresist composition comprising a novolak resin Positive type photoresist composition comprising a novolak resin

1991-10-28

1996-11-19

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430193, 528140, G03F 7023

Patent

active

055761399

ABSTRACT:
A novel positive type photoresist composition is provided, comprising an alkali-soluble novolak resin obtained by the condensation of substituted or unsubstituted phenols and aldehydes in the presence of a silica-magnesia solid catalyst and a light-sensitive material containing 1,2-naphthoquinone-diazido-5-(and/or -4-) sulfonate as main component.

REFERENCES:
patent: 4894311 (1990-01-01), Uenishi et al.
patent: 4957846 (1990-09-01), Jeffries, III et al.
patent: 4970287 (1990-11-01), Blakeney et al.
patent: 4988601 (1991-01-01), Ushirogouchi et al.
patent: 5110706 (1992-05-01), Yumoto et al.
patent: 5232819 (1993-08-01), Jeffries, III et al.

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