Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-04-11
1993-04-06
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430157, 430168, 430175, 430272, 430278, 430302, 430325, 430330, 430331, 525 61, 5253303, 5253305, 525376, 534560, 534561, 534563, 534564, 534565, G03F 7021, G03F 732
Patent
active
052002918
ABSTRACT:
A polymeric compound having the formula ##STR1## wherein x ranges from about 0.05 to about 0.5
REFERENCES:
patent: 2498722 (1950-02-01), Straley
patent: 3219447 (1965-11-01), Neugebauer et al.
patent: 3304297 (1967-02-01), Wegmann
patent: 3679419 (1972-07-01), Gillich
patent: 3720563 (1973-03-01), Kalopssis
patent: 3847614 (1974-11-01), Mattor
patent: 3849392 (1974-11-01), Steppan
patent: 3867147 (1975-02-01), Teuscher
patent: 4436804 (1984-03-01), Walls
patent: 4554236 (1985-11-01), Bentley et al.
patent: 4564580 (1986-01-01), Ichimura et al.
patent: 4618562 (1986-10-01), Walls et al.
patent: 4707437 (1987-11-01), Walls et al.
patent: 4812384 (1989-03-01), Franke et al.
patent: 4940646 (1990-07-01), Pawlowski
Bowers Jr. Charles L.
Hoechst Celanese Corporation
Roberts Richard S.
Young Christopher G.
LandOfFree
Photosensitive diazonium resin, element made therefrom, method o does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive diazonium resin, element made therefrom, method o, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive diazonium resin, element made therefrom, method o will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-535505