Mixer coupling lens subassembly for photolithographic system

Photocopying – Projection printing and copying cameras – Illumination systems or details

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355 74, 355 75, G03B 2772

Patent

active

044744633

ABSTRACT:
A mask illumination system for use in the production of semiconductor devices includes an optical assembly having an internal focal plane corresponding to the mask. A reticle edge masking assembly (REMA) is located at the internal focal plane and serves to define a pattern of light which is projected onto the mask. The provision of the reticle edge masking assembly in a focal plane separate from the mask plane serves to reduce blurriness caused by near field diffraction, as well as facilitating the use of more complex REMA assemblies.

REFERENCES:
patent: 3779643 (1973-12-01), Nosco et al.
patent: 3909130 (1975-09-01), Glaskov et al.
patent: 3941475 (1976-02-01), Sheets
patent: 3988066 (1976-10-01), Suzuki et al.
Application of Variable Optics to Solar Simulation Systems for Generation of High Intensity Light Beams, Harris et al., AIAA Paper No. 69-997, 1969.

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