Non-volatile semiconductor memory

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

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257322, 257324, 257325, 257395, 257411, 257530, 257635, 257637, 257638, 257640, H01L 2900, H01L 2934, H01L 2702, H01L 2968

Patent

active

053311817

ABSTRACT:
A non-volatile semiconductor memory providing a semiconductor substrate including source and drain diffusion regions and a gate electrode, and an insulating film which is at least provided on the semiconductor substrate just below the gate electrode and has a smaller dielectric breakdown strength on the source side than on the drain side, wherein the insulating film is comprised of a laminated film having a multilayer structure on the drain side and a single-layer film or multilayer film which is broken down at a smaller voltage on the source side than on the drain side, and a predetermined voltage is applied to break down the single-layer film or multilayer film on the source side, so that data can electrically be written only once.

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patent: 5063423 (1991-11-01), Fujii et al.
patent: 5134457 (1992-07-01), Hamdy et al.
patent: 5138410 (1992-08-01), Takebuchi

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