Apparatus for cathode sputtering

Details Apparatus for cathode sputtering Apparatus for cathode sputtering

1992-10-27

1994-07-19

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429809, 20429814, 20429812, 20429817, C23C 1434

Patent

active

053306325

ABSTRACT:
A target has a front sputtering surface including an inner annular surface and an outer frustoconical surface which are concentric to an axis and adjoin at an angle to form a break. A ring of magnets and a first ring-like pole shoe outside the target, together with a second pole shoe inside the target and a yoke facing the back of the target, provide lines of flux through the target and arcuately over the front surface to form a first plasma ring over the break and a second plasma ring radially outside the break.

REFERENCES:
patent: 4060470 (1977-11-01), Clarke
patent: 4414086 (1983-11-01), Lamont, Jr.
patent: 4547279 (1985-10-01), Kiyota et al.
patent: 4604180 (1986-08-01), Hirukawa et al.
patent: 4747926 (1988-05-01), Shimuzu et al.
patent: 4842703 (1989-06-01), Class et al.
patent: 4933064 (1990-06-01), Geisler et al.
patent: 4957605 (1990-09-01), Hurwitt et al.

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