Photosensitive material processor

Details Photosensitive material processor Photosensitive material processor

1993-04-27

1994-08-23

Rutledge, D.

G03D 302

Patent

active

053411897

ABSTRACT:
A processor for processing photosensitive material having a first processing tank containing a first processing fluid containing at least one component of a first concentration and a second processing tank containing processing fluid having the same component to that of the first processing fluid, however, the concentration of the component being different than the first concentration. A weir is provided for causing fluid to flow from the first tank to the second tank resulting from the hydrostatic pressure of the first fluid in the first tank. The weir has a configuration such that concentration difference between processing fluid in said tanks does not change significantly over a predetermined period of time.

REFERENCES:
patent: 4719173 (1988-01-01), Hahm
patent: 4804990 (1989-02-01), Jessop
patent: 5001506 (1991-03-01), Nakamura
patent: 5063141 (1991-11-01), Nakamura
patent: 5177521 (1993-01-01), Mogi et al.

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