Phase-shifting mask structure and method of fabricating the same

Details Phase-shifting mask structure and method of fabricating the same Phase-shifting mask structure and method of fabricating the same

1998-05-21

1999-12-21

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

06004702&

ABSTRACT:
A phase-shifting mask (PSM) structure and a method for fabricating the same are provided. The PSM structure includes a quartz substrate and a shifter layer formed over said quartz substrate, each shifter layer being formed with a first thickness of specific value to serve as the blinding portion of the PSM and a second thickness of specific value to serve as the phase-shifting portion of the PSM. The shifter layer of two different thicknesses can be used to replace the conventional chromium layer to provide the desired blinding and phase shifting effects of the PSM.

REFERENCES:
patent: 5535516 (1996-07-01), Hashimoto et al.
patent: 5604060 (1997-02-01), Miyashita et al.
patent: 5674647 (1997-10-01), Isao et al.

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