Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-12-09
1991-03-05
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430193, 430311, 430326, G03C 154, G03C 160, G03F 7022, G03F 7023
Patent
active
049977423
ABSTRACT:
A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
REFERENCES:
patent: 3269837 (1966-08-01), Sus et al.
patent: 3890152 (1975-06-01), Ruckert et al.
patent: 3965278 (1976-06-01), Duinker et al.
patent: 4672021 (1987-06-01), Blumel et al.
Covington John B.
Kim Peter
Marriott Vic B.
Venable Larry G.
Bowers Jr. Charles L.
Texas Instruments Inc.
LandOfFree
Water soluble contrast enhancement composition with 1-oxy-2 diaz does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Water soluble contrast enhancement composition with 1-oxy-2 diaz, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Water soluble contrast enhancement composition with 1-oxy-2 diaz will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-496078