Method for formation of high temperature superconductor films wi

Details Method for formation of high temperature superconductor films wi Method for formation of high temperature superconductor films wi

1987-09-04

1990-06-05

Roy, Upendra

Superconductor technology: apparatus, material, process

High temperature , per se

Having tc greater than or equal to 150 k

427 531, 427 62, 427 63, 437 19, 437 54, 437910, 20419224, H01L 21263

Patent

active

049314246

ABSTRACT:
A method for forming hybrid semiconductor/superconductor circuits employs masking a substrate slab into regions to have superconductor devices therein, depositing superconductor ceramic compound materials within said regions, masking the substrate slab upper surface outside of the regions with reflective material, and heating the superconductor material to a temperature desired for firing or sintering the material. The semiconductor slab outside of the superconducting region is maintained at a relatively low temperature by reflection of the incident energy by the reflective material. After heating of the superconducting material to its ceramic form, the reflective material is removed and the remainder of the semiconductive circuit is processed in a conventional manner.

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