Electron beam exposure system

Details Electron beam exposure system Electron beam exposure system

1978-10-18

1980-04-15

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250492A, 250396ML, A61K 2702

Patent

active

041985699

ABSTRACT:
The electron beam exposure system according to this invention has a mask with a pattern cut therein that comprises a plurality of sub-patterns that make up an exposed pattern to be formed on the substrate, a first deflecting means for having electron beams sequentially select sub-patterns in the mask, and a second deflecting means that, in synchronism with said first deflecting means, combines the sub-patterns in said mask irradiated with said electron beams to thereby form a complete image of said exposed pattern on said substrate. The system of this invention further comprises a third deflecting means which uses electron beams having a cross section adequately smaller than each sub-pattern in the mask and which has such electron beams scan the selected sub-patterns in the mask, and a fourth deflecting means for arraying and exposing a plurality of complete images of said exposed pattern on said substrate. Said second deflecting means combines the sub-patterns in the mask in synchronism with said first and third deflecting means.

REFERENCES:
patent: 4099062 (1978-07-01), Kitcher
patent: 4136285 (1979-01-01), Anger

Affiliated with

Also associated with

Rating

Electron beam exposure system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam exposure system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam exposure system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-477325