Method for the preparation of thin films of high-temperature-res

Details Method for the preparation of thin films of high-temperature-res Method for the preparation of thin films of high-temperature-res

1978-04-20

1980-04-15

Esposito, Michael F.

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

427124, 427252, 427255, 427295, 427319, 427320, 427113, 427314, 4272551, 4272552, C23C 1100, C23C 1300, B05D 300, B05D 302

Patent

active

041984498

ABSTRACT:
Disclosed herein is the preparation of thin films of tungsten, molybdenum, rhenium or osmium on a high-temperature resistant substrate by thermal evaporation in a high vacuum, wherein the oxides of these high-temperature-resistant metals are evaporated simultaneously with a reduction metal in a manner such that the oxide molecules and the metal atoms or molecules impinge together on the surface of the substrate heated to a predetermined temperature and react with each other there chemically, so that the high-temperature-resistant metal oxides are reduced and the reduction metals are oxidized. In this process, the high-temperature-resistant metal is deposited on the surface of the substrate, and the oxides of the reduction metals evaporate, either completely or partially, and are pumped off.

REFERENCES:
patent: 3963839 (1976-06-01), Freller

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