Control of electroless plating baths

Coating processes – Measuring – testing – or indicating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4274431, 427437, B05D 118

Patent

active

048141976

ABSTRACT:
Methods of analyzing and controlling an electroless plating solution are described which provide for real time control of the electroless plating solution, e.g., an electroless copper bath whose main constituents are copper sulfate, complexing agent, formaldehyde, a hydroxide and a stabilizer. All necessary constituent concentrations, particularly the reducing agent concentration, are measured in situ and may be used to analyze and/or control the composition of the bath. A control cycle of less than one minute is required and hence real time control is achieved. The in situ measurements also provide quality indicia of the copper quality factors which are likewise used to control composition of the bath. Data from the in situ measurements is fed to a computer which, in turn, controls additions to the bath to maintain a bath composition which provides good quality electrolessly formed, copper plating.

REFERENCES:
patent: 3532519 (1970-10-01), Hirohata
patent: 4132605 (1979-01-01), Tench
patent: 4209331 (1980-06-01), Kukanskis
patent: 4331699 (1982-05-01), Suzuki
patent: 4353933 (1982-10-01), Araki
patent: 4541902 (1985-09-01), Kinoshita
patent: 4563217 (1986-01-01), Kikuchi
patent: 4565575 (1986-01-01), Cardin
patent: 4623554 (1986-11-01), Kaschak
patent: 4631116 (1986-12-01), Ludwig
R. Haak et al., "Cyclic Voltammetric Analysis of Acid Copper Sulfate Plating Baths" Plating and Surface Finishing, Apr., 1981, pp. 52-55 and Mar., 1982, pp. 62-66.
Milan Pannovic, "An Electrochemical Control System for Electroless Copper Bath" J. Electrochem. Soc., vol. 127, No. 2, Feb. 1980, pp. 365-369.
"Mechanisms of Electroless Metal Plating: II. Decomposition of Formaldehyde", IBM J. Res. Develop. 28, 679 (1984), Bindra et al., IBM J. Res. Develop., vol. 28, No. 6, Nov. 1984, pp. 679-688.
Okinaka, Turner, Wolwodiuk and Graham, Abstract No. 275, Electrochem. Soc. Fall Meeting, Oct. 1976, Extended Abstracts, vol. 76-2.
Okinaka, Graham, Wolwodiuk and Putvinski, The Western Electric Engineer, 22 (2), 72 (1978).
G. Herrmann, Metalloberflache-Agnew. Elektrochem., 26, 334 (1972).
F. L. Shippey, C. U. Yu, and F. M. Donahue, Plating, 762-764 (8) (1972).
M. J. Brown, Insulation/Circuits, 21 (11), 17 (1975).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Control of electroless plating baths does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Control of electroless plating baths, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Control of electroless plating baths will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-476188

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.