Photosensitive member of plasma polymerized amorphous carbon cha

Details Photosensitive member of plasma polymerized amorphous carbon cha Photosensitive member of plasma polymerized amorphous carbon cha

1989-08-18

1990-03-06

Martin, Roland E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

435 60, 435 66, G03G 514

Patent

active

049065440

ABSTRACT:
The practice of this invention provides a photosensitive member which comprises a charge generating layer, and a plasma-polymerized layer, wherein said plasma-polymerized layer having an infrared absorption spectrum of a ratio of coefficients of absorptivities attributed to methyl group (--CH.sub.3) to those of methylene group (--CH.sub.2 --), and is a coefficient of absorptivity attributed to methylene group (--CH.sub.2 --) at about 2925 cm.sup.-1. The photosensitive member obtained thereby is excellent in charge-transporting property and chargeability and, moreover, exhibits advantages in corona resistance and resistances to acids, moisture and heat and also in physical properties such as stiffness.

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