Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating selected area
Patent
1996-11-15
2000-10-17
Nguyen, Nam
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Coating selected area
205124, 205219, 438584, 438758, 438778, 136258, 136290, 257 52, 257 53, 257431, 257458, 257632, 257647, 257798, C25D 502
Patent
active
061325856
ABSTRACT:
The present invention aims to provide a highly reliable semiconductor element with high performance, and a fabrication method for such highly reliable semiconductor with excellent mass producibility. The photovoltaic elements comprise an electric conductor, semiconductor regions and a transparent conductor layer, which are sequentially formed on a substrate. The shunt resistance in the semiconductor element is rendered in the range from 1.times.10.sup.3 .OMEGA.cm.sup.2 to 1.times.10.sup.6 .OMEGA.cm.sup.2 by performing a forming treatment and a short circuit passivation treatment after forming the transparent conductor layer, and then selectively covering with insulation the defective portions with a cationic or anionic electrodeposited resin, or performing a forming treatment, after forming the semiconductor layers, then selectively covering with insulation the defective portions with a cationic or anionic electrodeposited resin, and then forming the transparent conductor layer.
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M. Matsumura et al. "Improvement and Amorphous silicon solar cells by electrochemical treatment", J. of Applied Physics, vol. 61, No. 4, Feb. 15, 1987 pp. 648-169.
Patent Abstracts of Japan, vol. 119, Apr. 14, 1987 and JPA-61-265-874, Nov. 25, 1986.
Ichinose Hirofumi
Midorikawa Takafumi
Mori Takahiro
Murakami Tsutomu
Canon Kabushiki Kaisha
Nguyen Nam
Ver Steeg Steven H.
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