Method of making a light emitting semiconductor having a rear re

Fishing – trapping – and vermin destroying

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148DIG26,DIG.95, 148DIG106, 156610, 437 81, 437 89, 437132, 437962, H01L 2120, H01L 21203

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049719289

ABSTRACT:
A light emitting semiconducting structure is formed over a light reflecting surface using epitaxial growth techniques. The light reflecting surface is provided by an appropriate metal layer intermediately disposed between two dielectric layers, this multi-layer structure is disposed intermediate between an underlying substrate and the overlaying light emitting semiconducting components. The light reflecting surface provides enhanced photon reflectance for the light emitting device. The active region of the light emitting device is formed using epitaxial growth techniques.

REFERENCES:
patent: 4178197 (1979-12-01), Marinace
patent: 4420873 (1983-12-01), Leonberger et al.
patent: 4426767 (1984-01-01), Swanson et al.
patent: 4551394 (1985-11-01), Betsch et al.
patent: 4587717 (1986-05-01), Daniele et al.
patent: 4774205 (1988-09-01), Choi et al.
patent: 4826784 (1989-05-01), Salerno et al.
patent: 4837182 (1989-06-01), Bozler et al.
patent: 4891093 (1990-01-01), Smith
patent: 4910164 (1990-03-01), Shichijo
Ishiguro et al., "High efficient GaAlAs light-emitting diodes of 660 nm with a double heterostructure on a GaAlAs substrate", Appl. Phys. Lett. 43(11), Dec. 1, '83.
Asai, "Anisotropic Later Growth in GaAs MOCVD Layers on (001) Substrates", Journal of Crystal Growth 80 (1987), 425-433, North-Holland, Amsterdam.
Gale et al., "Later epitaxial overgrowth of GaAs by organometallic chemical vapor deposition", Appl. Phys. Lett., vol. 41, No. 6, 15 Sept. '82.
Cheng et al., "Aspects of GaAs Selective Area Growth by Molecular Beam Epitaxy with Patterning by SiO.sub.2 Masking", J. Electrochem. Soc.: Solid-State Science and Technology, vol. 130, No. 10, Oct. '83.
Asai et al., "Lateral Growth Process of GaAs over Tungsten Gratings by Metalorganic Chemical Vapor Deposition", J. Electrochem. Soc.: Solid-State Science and Technology, vol. 132, No. 10, Oct. '83.
McClelland et al., "A Technique for Producing Epitaxial Films on Reusable Substrates", Appl. Phys. Lett., 37(6), Sep. 15, 1980, pp. 560-2.
Gale et al. "Lateral Epitaxial Overgrowth of GaAs and GaAlAs . . . " Inst. Phys. Conf. Ser. No. 65, Paper presented at Int. Symp. GaAs and Related Compounds, Albuquerque, 1982, pp. 101-108.

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