Photosetting resin compositions

Details Photosetting resin compositions Photosetting resin compositions

1982-09-21

1984-01-10

Morris, Theodore

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415915, 5263231, 5263232, C08F 246

Patent

active

044252099

ABSTRACT:
A photosetting resin composition containing more than 10% by weight of one or more resins each having more than 3 functional groups--acryloyl or methacryloyl radicals--and a sensitizer. Since the compositions contain more than 10% by weight of one or more resins each having more than three functional groups, they exhibit very satisfactory and well balanced resistance-to-solder (JISC-6481, 260.degree. C., 10 sec), flexural strength (JISP-8115, 0.38R, 180.degree. bending) and adhesion (JISD-0202, chequer pattern test).

REFERENCES:
patent: 3785849 (1974-01-01), Parker et al.
patent: 3989610 (1976-11-01), Tsukada
patent: 4014771 (1977-03-01), Rosenkranz
patent: 4056453 (1977-11-01), Barzywski
patent: 4169732 (1979-10-01), Shipley
patent: 4273802 (1981-06-01), Kamada et al.
Chem. Abst. 84:6651u, Yoshihara et al., Jul. 3, 1975.

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