Method for manufacturing polyimide thin films by plasma polymeri

Details Method for manufacturing polyimide thin films by plasma polymeri Method for manufacturing polyimide thin films by plasma polymeri

1989-12-29

1991-03-12

Morgenstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 44, 427 39, 427 38, 427166, 4272556, 4272481, 428435, 428458, B05D 306, B32B 1508, B32B 1710, B32B 2734

Patent

active

049992155

ABSTRACT:
A method of manufacturing a polyimide thin film is disclosed which comprises supplying vapors of a polyimide starting material comprising a plurality of polyimide forming monomers into a plasma atmosphere, transferring the ionized polyimide starting material, under an electric field, to the surface of a glass or metallic substrate and depositing the material thereon, and heating the same during or after deposition, thereby forming a polyimide thin film as an orientation film on the substrate.

REFERENCES:
patent: 4560641 (1985-12-01), Kokaku et al.
patent: 4624867 (1986-11-01), Irjima et al.
patent: 4664935 (1987-05-01), Strahl
patent: 4713288 (1987-12-01), Kokaku et al.
patent: 4743327 (1988-05-01), Dehaan et al.
patent: 4808468 (1989-02-01), Nojiri et al.

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