Method for washing deposition film-forming device

Details Method for washing deposition film-forming device Method for washing deposition film-forming device

1989-06-06

1991-03-12

Chaudhuri, Olik

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

156643, C03C 1500, B08B 700

Patent

active

049989790

ABSTRACT:
A method for washing a deposition film-forming device for forming deposition films comprises removing the reaction product attached on the interior of the reaction vessel during formation of the deposition film with ClF.sub.3 gas.

REFERENCES:
patent: 4310380 (1982-01-01), Flamm
patent: 4498953 (1985-02-01), Cook
patent: 4581101 (1986-04-01), Senoue
patent: 4787957 (1988-11-01), Barkanic

Affiliated with

Also associated with

Rating

Method for washing deposition film-forming device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for washing deposition film-forming device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for washing deposition film-forming device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-446219