Method of making self-aligned recessed oxide isolation regions

Metal working – Method of mechanical manufacture – Assembling or joining

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29571, 29577C, 148 15, 148187, 148DIG106, 357 234, 357 239, 357 51, H01L 21302, H01L 21263

Patent

active

046759824

ABSTRACT:
A simple process is provided for making two self-aligned recessed oxide isolation regions of different thicknesses which includes the steps of defining first and second spaced apart regions on the surface of a semiconductor substrate, forming a protective layer over the first region, forming a first insulating layer of a given thickness within the second region while the first region is protected by the protective layer, removing the protective layer from the first region and forming a second insulating layer thinner than that of the first layer within the first region. Field regions may be ion implanted prior to forming the insulating layers.

REFERENCES:
patent: 3387286 (1968-06-01), Dennard
patent: 3811076 (1974-05-01), Smith, Jr.
patent: 3841926 (1974-10-01), Garnache et al.
patent: 4326329 (1982-04-01), McElroy
patent: 4343079 (1982-08-01), Jochens
patent: 4459740 (1984-07-01), Schwabe
patent: 4462151 (1984-07-01), Geipel, Jr. et al.
patent: 4471373 (1984-09-01), Shimizu et al.
patent: 4502208 (1985-03-01), McPherson
patent: 4525811 (1985-06-01), Masuoka
patent: 4549340 (1985-10-01), Nagasawa et al.
patent: 4561170 (1985-12-01), Doering et al.
patent: 4574465 (1986-03-01), Rao
D. L. Critchlow et al, IBM Technical Disclosure Bulletin, vol. 27, No. 11, Apr. 1985, pp. 6422-6424, "Dual ROX Dynamic RAM Array".
A. Mohsen et al, IEDM 82, pp. 610-619, "A High Density, High Performance 1T Dram Cell".

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of making self-aligned recessed oxide isolation regions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making self-aligned recessed oxide isolation regions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making self-aligned recessed oxide isolation regions will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-440207

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.