Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Patent
1987-05-04
1988-11-22
Wintercorn, Richard A.
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
353101, 355 53, G03B 2752
Patent
active
047869470
ABSTRACT:
A semiconductor device manufacturing projection exposure apparatus in which a pattern of a reticle is projected onto a semiconductor wafer through a projection optical system having a lens element and in which the reticle is irradiated with a light of a predetermined wavelength to thereby transfer the pattern of the reticle onto the semiconductor wafer. The apparatus includes a chamber adapted to house the reticle, the wafer and the projection optical system in a substantially closed space, detectors for detecting a temperature and a pressure of a gas contained in the space, and an adjusting unit for adjusting the temperature and pressure of the gas in the chamber, from the outside of the chamber, the operation of the adjusting unit being controlled on the basis of the detection by the detectors, whereby the temperature and pressure of the gas contained in the space are regulated so as to be best suited to retain a predetermined optical performance of the projection optical system and, whereby, high-precision pattern transfer is assured.
REFERENCES:
patent: 3936184 (1976-02-01), Tanaka et al.
patent: 4050802 (1977-09-01), Tanaka et al.
patent: 4198159 (1980-04-01), Cachon
patent: 4202623 (1980-05-01), Watkin
patent: 4477183 (1984-10-01), Kawamura et al.
patent: 4496239 (1985-01-01), Isohata et al.
patent: 4503335 (1985-03-01), Takahashi
patent: 4540251 (1985-09-01), Yau et al.
patent: 4564284 (1986-01-01), Tsutsui
patent: 4583840 (1986-04-01), Yabu et al.
patent: 4690528 (1987-09-01), Tanimoto et al.
Kosugi Masao
Matsushita Toshikazu
Ohta Masakatsu
Yabu Shuichi
Canon Kabushiki Kaisha
Wintercorn Richard A.
LandOfFree
Projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-438171