Method for forming a thin film for a semiconductor device

Details Method for forming a thin film for a semiconductor device Method for forming a thin film for a semiconductor device

1991-10-24

1994-03-22

Maples, John S.

Fishing, trapping, and vermin destroying

437190, 437192, 437195, 4271261, H01L 21441

Patent

active

052964043

ABSTRACT:
A method for forming a thin film, comprising the steps of:

REFERENCES:
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4570328 (1986-02-01), Price et al.
patent: 4800176 (1989-01-01), Kakumu et al.
patent: 4878994 (1989-11-01), Jucha et al.
patent: 4973883 (1990-11-01), Hirose et al.
patent: 5080927 (1992-01-01), Ikeda et al.
Journal of Vacuum Science and Technology: Part A; vol. 7, No. 1, Jan. 1989, New York US pp. 31.varies.35.
Journal of Vacuum Science and Technology: Part A; vol. 4, No. 6, Nov. 1986 New York US pp. 2726-2730.

Affiliated with

Also associated with

Rating

Method for forming a thin film for a semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a thin film for a semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a thin film for a semiconductor device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-436542