Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1993-01-25
1994-03-22
Beck, Shrive
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427571, 427598, B05D 306, B05D 302
Patent
active
052962725
ABSTRACT:
An object which is to be implemented with ions is enclosed in a container. A plasma is generated in a chamber which is separate from, and opens into the container. The plasma diffuses from the chamber into the container to surround the object with uniform density. High voltage negative pulses are applied to the object, causing the ions to be accelerated from the plasma toward, and be implanted into, the object. Line-of-sight communication between a plasma generation source located in the chamber and the object is blocked, thereby eliminating undesirable effects including heating of the object by the source and transfer of thermally discharged material from the source to the object. Two or more chambers may be provided for generating independent plasmas of different ion species which diffuse into and uniformly mix in the container. The attributes of the different plasmas may be individually selected and controlled in the respective chambers.
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Goebel Dan M.
Matossian Jesse N.
Beck Shrive
Denson-Low W. K.
Duraiswamy V. D.
Hughes Aircraft Company
Utech Benjamin L.
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